Eligible for Return, Refund or Replacement within 30 days of receipt.
OTF-1200X-RTP-II-5-R is an advanced rapid thermal processing furnace with 11″ I.D. quartz chamber and 5?x5″ rotating sample holder. It is designed for CSS film coating up to 5″ circular or square wafer samples at working temperature of 800?C Max. The furnace is heated by two group of halogen heaters (Top and Bottom) separately with max. 10?C/s heating rate. The top sample holder is rotatable to achieve high uniformity coating. It is an excellent tool to research new generation thin film for solar cells, such as CdTe, Sulfide, and Perovskite solar cell.
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